United States Patent Patent No.:7,853,102
Polymer Wavelength Filters with High-resolution Periodical Structures and its Fabrication using Replication process
Inventor:Kun-Yi Lee (李昆益) E-mail:kelvin@cc.cust.edu.tw
Abstract: This invention describes a procedure to replicate a polymeric wavelength filter. In this invention, the grating structure on a polymer is fabricated first using holographic interferometry and micro-molding processes. The polymeric wavelength filters are produced by a two-step molding process where the master mold is first formed on a negative tone photoresist and subsequently transferred to a PDMS mold; following this step, the PDMS silicon rubber mold was used as a stamp to transfer the pattern of the polymeric wavelength filters onto a UV cure epoxy. |